专利名称：VITREOUS SILICA CRUCIBLE FOR PULLING
SILICON SINGLE CRYSTAL AND METHOD OFMANUFACTURING THE SAME
发明人：Toshiaki Sudo,Makiko Kodama,Minoru
Kanda,Hiroshi Kishi
申请号：US13394284申请日：20100810
公开号：US20120160159A1公开日：20120628
专利附图：
摘要：The present invention provides a vitreous silica crucible which can suppress the
sidewall lowering of the crucible under high temperature during pulling a silicon singlecrystal, and a method of manufacturing such a vitreous silica crucible. The vitreous silicacrucible includes an opaque vitreous silica layer provided on the outer surface side of thecrucible and containing numerous bubbles, and a transparent vitreous silica layerprovided on the inner surface side. The opaque vitreous silica layer includes a firstopaque vitreous silica portion provided on the crucible upper portion, and a secondopaque vitreous silica portion provided on the crucible lower portion. The specific gravityof the second opaque vitreous silica portion is 1.7 to 2.1, and the specific gravity of thefirst opaque vitreous silica portion is 1.4 to 1.8, and smaller than that of the secondopaque vitreous silica portion. The particle size distribution of the material silica powderfor the first opaque vitreous silica portion is wider than that of the second opaquevitreous silica portion and the material silica powder for the first opaque vitreous silicaportion includes more fine powder than that for the second opaque vitreous silicaportion
申请人：Toshiaki Sudo,Makiko Kodama,Minoru Kanda,Hiroshi Kishi
地址：Akita-shi JP,Akita-shi JP,Akita-shi JP,Akita-shi JP
国籍：JP,JP,JP,JP
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